Microtechnology/Additional Methods

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Additional Methods

Apart from additiev and etching processes, there is also a range of processes to alter the materials properties and to characterize them.

Rapid Thermal Anneal (RTA)

Wafer Bonding

Wafer bonding

Wafer bond characterization

Doping

Ion Implantation

Packaging

Interconnections

Encapsulation

Glues

Ellipsometry

Ellipsometers are used to measure thin film thicknesses by their optical properties (refractive index and reflectivity/absorbance).

4 Point Measurements

The four-point probe technique can be used to measure the conductivity of thin films. For improved measurements micro four-point probes can be used. Capres has an application note about micro four-point probes.

Atomic Force Microscopy

The Atomic force microscope (AFM) is mainly used to measure the topography of a surface, such as the roughness.

Scanning Electron Microscopy

JEOL has a good guide to SEM image interpretation

Optical Microscopy

Theres a good introduction to optical microscopy from Zeiss.

Vacuum Equipment

References

See also notes on editing this book about how to add references Microtechnology/About#How to Contribute.

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